光刻机被誉为“半导体工业皇冠上的明珠”,是集成电路制造行业的核心设备。本文对光刻机的产业发展路径展开分析,从全球产业链与创新链布局、光刻机技术沿革、阿斯麦(ASML)发展历程、中国的产业政策等多个视角进行梳理,展望中国光刻机产业的未来发展方向。现阶段,中国在光刻机领域仍然面临技术瓶颈,从国家战略层面出发,政府和企业均需要做好光刻机研发“持久战”的准备,保障光刻机产业政策的连贯性。从政策层面出发,一方面,需要推动形成良好的上下游合作关系,提高政策瞄准精度以及重视研发体系构建;另一方面,要推动产业分工,加强开放合作,加快光刻机产业链国产替代进程。
<<Lithography is known as “the jewel in the crown of semiconductor industry” and is the core equipment of integrated circuit manufacturing industry. This chapter analyzes the development path of lithography industry,analyzes the layout of global industrial chain and innovation chain,the evolution of lithography technology,ASML’s development history,China’s industrial policy and other perspectives,and looks into the future development direction of China’s lithography industry. China is still limited by technical bottlenecks in the field of lithography. From the perspective of national strategy,both the government and enterprises need to be prepared for a “protracted war” in lithography research and development to ensure the coherence of lithography industrial policies. From the perspective of policy,on the one hand,government departments need to promote the formation of good upstream and downstream cooperation,improve the precision of policy targeting and pay attention to the construction of R&D system;On the other hand,it is necessary to promote the industrial division of labor and strengthen the openness and cooperation,accelerate the process of lithography industry chain.
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